Portal de Periódicos da CAPES

Automatic Test Pattern Generation for Interconnect Open Defects

2008; Institute of Electrical and Electronics Engineers; Linguagem: Inglês

10.1109/vts.2008.30

2375-1053

Stefan Spinner, Ilia Polian, Piet Engelke, Bernd Becker, Martin Keim, Wu-Tung Cheng,

Advancements in Photolithography Techniques

We present a fully automated flow to generate test patterns for interconnect open defects. Both inter-layer opens (open- via defects) and arbitrary intra-layer opens can be targeted. An aggressor-victim model used in industry is employed to describe the electrical behavior of the open defect. The flow is implemented using standard commercial tools for parameter extraction (PEX) and test generation (ATPG). A highly optimized branch-and bound algorithm to determine the values to be assigned to the aggressor lines is used to reduce both the ATPG efforts and the number of aborts. The resulting test sets are smaller and achieve a higher defect coverage than stuck-at n-detection test sets, and are robust against process variations.