The annealing effect on structural and optical properties of ZnO thin films produced by r.f. sputtering
2007; Elsevier BV; Volume: 42; Issue: 1-6 Linguagem: Inglês
10.1016/j.spmi.2007.04.069
ISSN1096-3677
AutoresA.G. Rolo, J. Ayres de Campos, T. Viseu, T. de Lacerda‐Arôso, M.F. Cerqueira,
Tópico(s)GaN-based semiconductor devices and materials
ResumoIn this work, a study of the structure and optical properties of undoped ZnO thin films produced by r.f. magnetron sputtering technique as a function of the growth parameters is reported. Modification under annealing conditions is also analysed. Raman spectroscopy, X-ray photoelectron spectroscopy, X-ray diffraction and optical transmittance have been used. From the position of the (002) X-ray diffraction peak and the E2 (high) mode detected in Raman spectra, the residual stress both in the as-grown and in the annealed samples has been estimated.
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