Deeply Etched <formula formulatype="inline"><tex>$\hbox{SiO}_{2}$</tex></formula> Ridge Waveguide for Sharp Bends
2006; Institute of Electrical and Electronics Engineers; Volume: 24; Issue: 12 Linguagem: Inglês
10.1109/jlt.2006.885243
ISSN1558-2213
Autores Tópico(s)Semiconductor Lasers and Optical Devices
ResumoA deeply etched SiO 2 ridge waveguide including the buffer, core, and cladding is presented for realizing sharp bends. The present SiO 2 ridge waveguide has a strong confinement at the lateral direction, while it has a weak confinement at the vertical direction. Due to the strong confinement, a sharp bend (with a very small bending radius of about 10 mum) is obtained for an acceptable bending loss. A detailed analysis of the loss in a bent waveguide is given by using a finite-difference method. In order to reduce the transition loss, a narrow bending section with an optimal lateral offset is used. A low leakage loss is obtained by using wide straight waveguides, and linear tapers are used to connect the wide straight section and narrow bent sections
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