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Comparison of CxNy:H films obtained by deposition using magnetron sputtering or an inductively coupled plasma

2000; Wiley; Volume: 29; Issue: 6 Linguagem: Inglês

10.1002/1096-9918(200006)29

1096-9918

Dagou A. Zeze, D. R. North, N.M.D. Brown, C.A. Anderson,

Semiconductor materials and devices

Surface and Interface AnalysisVolume 29, Issue 6 p. 369-376 Research Article Comparison of CxNy:H films obtained by deposition using magnetron sputtering or an inductively coupled plasma D. A. Zeze, Corresponding Author D. A. Zeze DA.Zeze@ulst.ac.uk Surface Science Laboratory, University of Ulster, BT52 1SA, Coleraine, Northern IrelandSurface Science Laboratory, University of Ulster, BT52 1SA, Coleraine, Northern IrelandSearch for more papers by this authorD. R. North, D. R. North Surface Science Laboratory, University of Ulster, BT52 1SA, Coleraine, Northern IrelandSearch for more papers by this authorN. M. D. Brown, N. M. D. Brown Surface Science Laboratory, University of Ulster, BT52 1SA, Coleraine, Northern IrelandSearch for more papers by this authorC. A. Anderson, C. A. Anderson Surface Science Laboratory, University of Ulster, BT52 1SA, Coleraine, Northern IrelandSearch for more papers by this author D. A. Zeze, Corresponding Author D. A. Zeze DA.Zeze@ulst.ac.uk Surface Science Laboratory, University of Ulster, BT52 1SA, Coleraine, Northern IrelandSurface Science Laboratory, University of Ulster, BT52 1SA, Coleraine, Northern IrelandSearch for more papers by this authorD. R. North, D. R. North Surface Science Laboratory, University of Ulster, BT52 1SA, Coleraine, Northern IrelandSearch for more papers by this authorN. M. D. Brown, N. M. D. Brown Surface Science Laboratory, University of Ulster, BT52 1SA, Coleraine, Northern IrelandSearch for more papers by this authorC. A. Anderson, C. A. Anderson Surface Science Laboratory, University of Ulster, BT52 1SA, Coleraine, Northern IrelandSearch for more papers by this author First published: 06 June 2000 https://doi.org/10.1002/1096-9918(200006)29:6 3.0.CO;2-DCitations: 5AboutPDF ToolsRequest permissionExport citationAdd to favoritesTrack citation ShareShare Give accessShare full text accessShare full-text accessPlease review our Terms and Conditions of Use and check box below to share full-text version of article.I have read and accept the Wiley Online Library Terms and Conditions of UseShareable LinkUse the link below to share a full-text version of this article with your friends and colleagues. Learn more.Copy URL Share a linkShare onFacebookTwitterLinked InRedditWechat Abstract Several CxNy:H specimens (A1–A6) were deposited using a magnetron sputtering system driven at 13.56 MHz in nitrogen with an unbiased substrate using a pure graphite target as the carbon source. For deposition in the inductively coupled plasma (ICP) rig concerned, driven at the same frequency, two source mixtures were used, i.e. either methane (CH4) or adamantane (C10H16) in nitrogen. Examination of the XPS C 1s envelope from the magnetron-deposited films shows different band shapes and two main peak positions depending on the bonding within the films. The band shapes and the energy positions of the peaks present are a function of the film composition (expressed as at.%), itself influenced by the deposition regime. The corresponding specimens deposited with the ICP rig from a CH4/N2 plasma exhibit C 1s envelopes showing clearly a significant difference in their shape (correlated with chemical shift) compared to those magnetron sputter-deposited using the pure graphite target. In the magnetron-deposited films one distinct C 1s band is observed, and its position and the contributing component lines therein change as a function of the relative abundance of C,O and N found in the films examined. The films deposited using C10H16/N2 mixtures give features for the C 1s envelope of the CxNy:H material obtained that, when compared to the data of the two sets of films alluded to above, are again different from those of the magnetron-deposited material. However, they do show similarities to the behaviour of the analogous CH4/N2 films. Comparison of specimens from these three deposition regimes indicates clearly a number of significant compositional and structural differences, depending on the route used. The details of the analogous N 1s component of the same specimens were also investigated. Finally, static SIMS of a diamond-like carbon specimen and CxNy:H films was performed, showing similarities for low m/z and differences for higher m/z, particularly with respect to the oxygen bound in the CxNy:H matrix. Copyright © 2000 John Wiley & Sons, Ltd. Citing Literature Volume29, Issue6June 2000Pages 369-376 RelatedInformation