Kinetics of Growth of Amorphous WO 3 Anodic Films on Tungsten
1980; Institute of Physics; Volume: 127; Issue: 5 Linguagem: Inglês
10.1149/1.2129809
ISSN1945-7111
AutoresF. Di Quarto, Agatino Di Paola, Carmelo Sunseri,
Tópico(s)Anodic Oxide Films and Nanostructures
ResumoThe kinetics of growth of anodic films have been studied in 0.01Nsolutions of , , , and at room temperature. The validity of the relationship was verified in the current density range 0.2–16 mA·cm−2, Nearly constant B values were found in all investigated solutions. A lower value of dielectric constant was measured for the anodic films grown in phosphoric acid solutions. The effect of phosphate ions incorporation on the breakdown voltage is also discussed. The hypothesis of growth in presence of high space charge is carefully considered.
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