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Hydrogen Silsesquioxane: A Molecular Precursor for Nanocrystalline Si−SiO 2 Composites and Freestanding Hydride-Surface-Terminated Silicon Nanoparticles

2006; American Chemical Society; Volume: 18; Issue: 26 Linguagem: Inglês

10.1021/cm0602803

1520-5002

Colin M. Hessel, Eric J. Henderson, Jonathan G. C. Veinot,

Nanowire Synthesis and Applications

We report the bulk preparation of nanocrystalline Si−SiO2 (nc-Si/SiO2) composites via straightforward reductive thermal annealing of a well-defined molecular precursor, hydrogen silsesquioxane. The presented method affords quantitative yields of composite powders in large quantities. Freestanding, hydride-surface-terminated silicon nanocrystals that photoluminesce throughout the visible spectrum are readily liberated from nc-Si/SiO2 composite powders upon etching in ethanol−water solutions of hydrofluoric acid. Composites and freestanding particles were characterized using transmission electron microscopy (TEM), selected area electron diffraction (SAED), X-ray powder diffraction (XRD), X-ray photoelectron spectroscopy (XPS), photoluminescence (PL) spectroscopy, Fourier transform infrared spectroscopy (FT−IR), and thermogravimetric analysis (TGA).