Ultra Low‐ k Films Derived from Hyperbranched Polycarbosilanes (HBPCS)
2008; Wiley; Volume: 18; Issue: 24 Linguagem: Inglês
10.1002/adfm.200801197
ISSN1616-3028
AutoresJitendra S. Rathore, Leonard V. Interrante, Géraud Dubois,
Tópico(s)Metal and Thin Film Mechanics
ResumoAbstract Dense and porous hyperbranched carbosiloxane thin films (HBCSO) are obtained by sol–gel processing using methylene‐bridged hyperbranched polycarbosilanes (HBPCSs) with the general compositional formula {(OMe) 2 Si(CH 2 )}. Introduction of porosity is achieved using a porogen templating approach, allowing the control of the films' dielectric constant from 2.9 to as low as 1.8. Over the entire dielectric range, the HBCSO films exhibit exceptional mechanical properties, 2–3 times superior to those obtained for non‐alkylene bridged organosiloxanes such as methylsilsesquioxanes (MSSQs) of similar densities and k ‐values.
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