Portal de Periódicos da CAPES

Masks for Hadamard transform optics, and weighing designs

1976; Optica Publishing Group; Volume: 15; Issue: 1 Linguagem: Inglês

10.1364/ao.15.000107

0003-6935

N. J. A. Sloane, Martin Harwit,

Advancements in Photolithography Techniques

This paper gives a brief survey of the design of masks for Hadamard spectrometers and image scanners. Three different criteria are described for judging a mask, as well as techniques for choosing masks that are not too far from the optimum.