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Athermal Azobenzene‐Based Nanoimprint Lithography

2016; Volume: 28; Issue: 13 Linguagem: Inglês

10.1002/adma.201505552

1521-4095

Christian Probst, Christoph Meichner, Klaus Kreger, L. Kador, Christian Neuber, Hans‐Werner Schmidt,

Force Microscopy Techniques and Applications

A novel nanoimprint lithography technique based on the photofluidization effect of azobenzene materials is presented. The tunable process allows for imprinting under ambient conditions without crosslinking reactions, so that shrinkage of the resist is avoided. Patterning of surfaces in the regime from micrometers down to 100 nm is demonstrated. As a service to our authors and readers, this journal provides supporting information supplied by the authors. Such materials are peer reviewed and may be re-organized for online delivery, but are not copy-edited or typeset. Technical support issues arising from supporting information (other than missing files) should be addressed to the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.