Field Crystallization of Anodic Niobia on Nb-O Substrates
2006; Institute of Physics; Volume: 1; Issue: 4 Linguagem: Inglês
10.1149/1.2215518
ISSN2151-2051
AutoresH. Habazaki, T. Ogasawara, Hidetaka Konno, Ken‐ichi Shimizu, Katsuhiko Asami, Shinji Nagata, Koichi Takayama, Peter Skeldon, G.E. Thompson,
Tópico(s)Electrochemical Analysis and Applications
ResumoSolid-solution Nb-O films, containing up to 50 at% oxygen, prepared by magnetron sputtering were used to investigate the influence of the oxygen on field crystallization during anodizing at 100 V in 0.1 mol dm-3 ammonium pentaborate electrolyte at 333 K. The findings reveal that field crystallization is hindered dramatically by addition of 20 at% oxygen to the substrate, while no crystallization occurs for an Nb-50 at% O substrate. Prior thermal treatment accelerates field crystallization of niobium, but not of the Nb-50 at% O substrate. The thermal treatment is considered to promote generation of pre-cursor sites for crystal nucleation. However, sufficient oxygen in the substrate may restrict pre- cursor development and/or reduce the compressive stresses in the amorphous anodic niobia that can facilitate crystal growth.
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