Design of the temperature control system for magnetron sputtering based on PLC
2013; Elsevier BV; Linguagem: Inglês
ISSN
1879-2715
Autores Tópico(s)Advanced Algorithms and Applications
ResumoThe accuracy and stability of temperature control system of magnetron sputtering technique are very important to deposit film materials with stable structure and excellent performance. This essay elaborated the performance characteristics and control method of temperature control system for magnetron sputtering taking Siemens S7-300 programmable controller(PLC)and man-machine interface(HMI) as the core. Expand analog input module(SM331) to convert standard analog signal of thermal resistance into digital form, and call temperature function block(FB58) in timer interrupt organization module(OB35)with STEP 7 software platform to realize PID closed-loop control; Using FB58 can transform PID operation results into pulse duty cycle to control solid state relays. PLC communicates with HMI function based on MPI protocol, and design a friendly control interface with WinCC flexible to achieve data input/output, parameter change, real time monitoring and alarm interlocking. This system has improved the automation level of magnetron sputtering temperature control, and shortened the regulation time of control loop and overshoots to ensure the accuracy and stability of temperature control.
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