Complex High‐Aspect‐Ratio Metal Nanostructures by Secondary Sputtering Combined with Block Copolymer Self‐Assembly
2016; Volume: 28; Issue: 38 Linguagem: Inglês
10.1002/adma.201602523
ISSN1521-4095
AutoresHwan‐Jin Jeon, Ju Young Kim, Woo‐Bin Jung, Hyeonsu Jeong, Yun Ho Kim, Dong Ok Shin, Seong‐Jun Jeong, Jonghwa Shin, Sang Ouk Kim, Hee‐Tae Jung,
Tópico(s)Advanced Polymer Synthesis and Characterization
ResumoHigh-resolution (10 nm), high-areal density, high-aspect ratio (>5), and morphologically complex nanopatterns are fabricated from a single conventional block copolymer (BCP) structure with a 70 nm scale resolution and an aspect ratio of 1, through the secondary-sputtering phenomenon during the Ar-ion-bombardment process. This approach provides a foundation for the design of new routes to BCP lithography.
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