In situ study of the electronic structure of atomic layer deposited oxide ultrathin films upon oxygen adsorption using ambient pressure XPS
2016; Royal Society of Chemistry; Volume: 6; Issue: 18 Linguagem: Inglês
10.1039/c6cy00575f
ISSN2044-4761
AutoresBaohua Mao, Ethan J. Crumlin, Eric C. Tyo, Michael J. Pellin, Štefan Vajda, Yimin Li, Sui‐Dong Wang, Zhi Liu,
Tópico(s)Electronic and Structural Properties of Oxides
ResumoAPXPS was used to investigate the effect of oxygen adsorption on the band bending and electron affinity of ALD Al 2 O 3 , ZnO and TiO 2 ultrathin films.
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