Materials and Processes for Deep-UV Lithography
1988; American Chemical Society; Linguagem: Inglês
10.1021/ba-1988-0218.ch003
ISSN0065-2393
AutoresTakao Iwayanagi, Takumi Ueno, Saburo Nonogaki, Hiroshi Itô, C. Grant Willson,
Tópico(s)Advanced optical system design
ResumoThis chapter provides a comprehensive review of the resist materials and processes that have been designed and developed to support high-resolution, deep-UV (DUV) lithography (i.e., lithography using radiation in the 200—300 - nm wavelength range). Special emphasis is placed on materials, their lithographic performance, and the chemistry responsible for their function. Topics include the fundamental relationships between resolution and exposure wavelength, sources of DUV radiation, and progress in the development of DUV exposure equipment. Unique applications including multilayer patterning schemes and excimer laser lithography are also discussed.
Referência(s)