On the fabrication of micro- and nano-sized objects: the role of interstitial clusters
2018; Springer Science+Business Media; Volume: 53; Issue: 10 Linguagem: Inglês
10.1007/s10853-018-2067-0
ISSN1573-4803
AutoresDiego Ribas Gomes, A. A. Turkin, David I. Vainchtein, J. Th. M. De Hosson,
Tópico(s)Advanced Materials Characterization Techniques
ResumoIon-induced bending phenomena were studied in free-standing nano-sized Al cantilevers with thicknesses in the range of 89–200 nm. The objective is to present a predictive and useful model for the fabrication of micro- and nano-sized specimens. Samples were irradiated in a Tescan Lyra dual beam system with 30 kV Ga+ ions normal to the sample surface up to a maximum fluence of ~ 2 × 1021 m−2. Irrespective of thickness, all samples bent initially away from the Ga+ beam; as irradiation proceeded, the bending direction was reversed. The Al cantilever bending behavior is discussed in terms of depth-dependent volume change due to implanted Ga atoms, radiation-induced point defects and interstitial clusters. A kinetic model is designed which is based on a set of rate equations for concentrations of vacancies, interstitial atoms, Ga atoms and clusters of interstitial atoms. The bending crossover is explained by the formation of sessile interstitial clusters in a zone beyond the Ga+ penetration range. Model predictions agree with our experimental findings.
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