Self-assembly morphology of block copolymers in sub-10 nm topographical guiding patterns
2018; Royal Society of Chemistry; Volume: 4; Issue: 1 Linguagem: Inglês
10.1039/c8me00046h
ISSN2058-9689
AutoresSteven Gottlieb, Benedikt Rösner, Laura Evangelio, Marta Fernández-Regúlez, Aurora Nogales, Mari Cruz García-Gutiérrez, Thomas F. Keller, J. Fraxedas, Tiberio A. Ezquerra, C. David, Francesc Pérez‐Murano,
Tópico(s)Advanced Polymer Synthesis and Characterization
ResumoFabrication of sub-10 nm topographical guiding patterns, block copolymer directed self-assembly, thorough morphology analysis and free energy modelling.
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