Artigo
Effect of Relative Surface Charge of Colloidal Silica and Sapphire on Removal Rate in Chemical Mechanical Polishing
2019; Springer Science+Business Media; Volume: 6; Issue: 2 Linguagem: Inglês
10.1007/s40684-019-00020-9
ISSN2198-0810
AutoresChuljin Park, Hyoungjae Kim, Hanchul Cho, Taekyung Lee, Doyeon Kim, Sangjik Lee, Haedo Jeong,
Tópico(s)Laser Material Processing Techniques
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