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Grid-assisted magnetron sputtering deposition of nitrogen graded TiN thin films

2020; Springer Nature; Volume: 2; Issue: 5 Linguagem: Inglês

10.1007/s42452-020-2617-3

2523-3971

Felipe C. Silva, Matheus A. Tunes, Philip D. Edmondson, Nelson Batista de Lima, Julio César Sagás, Luís César Fontana, Cláudio Geraldo Schön,

Copper Interconnects and Reliability

Titanium Nitride (TiN) films were obtained using the grid-assisted magnetron sputtering deposition technique on Al substrates in two conditions: under constant and variable nitrogen concentration along the thin solid film thickness. The formation of a film with variable N concentration (herein referred as graded film) was confirmed using energy filtered transmission electron microscopy, X-ray photoelectron spectroscopy and grazing incidence X-ray diffraction. The TiN thin films microstructures were also analysed using scanning and transmission electron microscopies (SEM and TEM). The viability of synthesizing TiN thin films with variable N concentration is herein proposed as an alternative method for tailoring the properties of such functional coating materials.