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Pulsed laser deposition of SrTiO3/LaGaO3 and SrTiO3/LaAlO3: Plasma plume effects

2010; American Institute of Physics; Volume: 97; Issue: 25 Linguagem: Inglês

10.1063/1.3529487

1520-8842

C. Aruta, S. Amoruso, R. Bruzzese, Xuan Wang, Davide Maccariello, F. Miletto Granozio, U. Scotti di Uccio,

Semiconductor materials and devices

The pulsed laser deposition of SrTiO3/LaGaO3 and SrTiO3/LaAlO3 interfaces is analyzed with a focus on the kinetic energy of the ablated species. LaGaO3 and LaAlO3 plasma plumes were studied by fast photography and space-resolved optical emission spectroscopy. Reflection high energy electron diffraction was performed proving a layer-by-layer growth up to 10−1 mbar oxygen pressure. The role of the energetic plasma plume on the two-dimensional growth and on the presence of interfacial defects at different oxygen growth pressures is discussed in connection with the conducting properties of the polar/nonpolar interfaces.