DeepNVM++: Cross-Layer Modeling and Optimization Framework of Nonvolatile Memories for Deep Learning
2021; Institute of Electrical and Electronics Engineers; Volume: 41; Issue: 10 Linguagem: Inglês
10.1109/tcad.2021.3127148
ISSN1937-4151
AutoresAhmet Inci, Mehmet Meric Isgenc, Diana Marculescu,
Tópico(s)Semiconductor materials and devices
ResumoNonvolatile memory (NVM) technologies, such as spin-transfer torque magnetic random access memory (STT-MRAM) and spin-orbit torque magnetic random access memory (SOT-MRAM), have significant advantages compared to conventional SRAM due to their nonvolatility, higher cell density, and scalability features. While previous work has investigated several architectural implications of NVM for generic applications, in this work, we present DeepNVM ++, a framework to characterize, model, and analyze NVM-based caches in GPU architectures for deep learning (DL) applications by combining technology-specific circuit-level models and the actual memory behavior of various DL workloads. We present both iso-capacity and iso-area performance and energy analysis for systems whose last-level caches rely on conventional SRAM and emerging STT-MRAM and SOT-MRAM technologies. In the iso-capacity case, STT-MRAM and SOT-MRAM provide up to $3.8 \times $ and $4.7 \times $ energy-delay product (EDP) reduction and $2.4 \times $ and $2.8 \times $ area reduction compared to conventional SRAM, respectively. Under iso-area assumptions, STT-MRAM and SOT-MRAM provide up to $2 \times $ and $2.3 \times $ EDP reduction and accommodate $2.3 \times $ and $3.3 \times $ cache capacity when compared to SRAM, respectively. We also perform a scalability analysis and show that STT-MRAM and SOT-MRAM achieve orders of magnitude EDP reduction when compared to SRAM for large cache capacities. Our comprehensive cross-layer framework is demonstrated on STT-/SOT-MRAM technologies and can be used for the characterization, modeling, and analysis of any NVM technology for last-level caches in GPUs for DL applications.
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