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Dependence of multifractal analysis parameters on the darkness of a processed image

2022; Elsevier BV; Volume: 156; Linguagem: Inglês

10.1016/j.chaos.2022.111811

1873-2887

Merike Martsepp, T. Laas, Katrin Laas, J. Priimets, Siim Tõkke, Valdek Mikli,

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In this study, four specimens of pure tungsten, which have been irradiated with a high-temperature plasma with 20, 40, 60, and 80 pulses, respectively, are considered. Scanning electron microscopy (SEM) and optical microscope (OM) images of these specimens are used to search for more suitable degrees of darkness for binarizing the images for multifractal analysis. The multifractal characteristics obtained from SEM and OM images are then compared for the same specimens. The study shows the application of multifractal analysis to SEM images is robust enough as the change of binarization level in a range of 30-70% leads to a change of multifractal characteristics about 0.5%. It has been found that the optimal binarization level for OM images is about 10%.