Pulse Plasma Deposition of Cubic Boron Nitride Thin Films on Silicon Substrate
1994; Wiley; Volume: 145; Issue: 1 Linguagem: Inglês
10.1002/pssa.2211450127
ISSN1521-396X
Autores Tópico(s)Boron and Carbon Nanomaterials Research
Resumophysica status solidi (a)Volume 145, Issue 1 p. K29-K32 Short Notes Pulse Plasma Deposition of Cubic Boron Nitride Thin Films on Silicon Substrate Pengxun Yan, Pengxun Yan Institute of Physics, Academia Sinica, Beijing Search for more papers by this authorSi-Ze Yang, Si-Ze Yang Institute of Physics, Academia Sinica, Beijing Search for more papers by this author Pengxun Yan, Pengxun Yan Institute of Physics, Academia Sinica, Beijing Search for more papers by this authorSi-Ze Yang, Si-Ze Yang Institute of Physics, Academia Sinica, Beijing Search for more papers by this author First published: 16 September 1994 https://doi.org/10.1002/pssa.2211450127Citations: 7 Beijing 100080, People's Republic of China. AboutPDF ToolsRequest permissionExport citationAdd to favoritesTrack citation ShareShare Give accessShare full text accessShare full-text accessPlease review our Terms and Conditions of Use and check box below to share full-text version of article.I have read and accept the Wiley Online Library Terms and Conditions of UseShareable LinkUse the link below to share a full-text version of this article with your friends and colleagues. Learn more.Copy URL Share a linkShare onFacebookTwitterLinked InRedditWechat Citing Literature Volume145, Issue116 September 1994Pages K29-K32 RelatedInformation
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