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A systematic database of thin-film measurements by EPMA Part I - Aluminum films

2000; Wiley; Volume: 29; Issue: 3 Linguagem: Inglês

10.1002/(sici)1097-4539(200005/06)29

1097-4539

G. F. Bastin, H. J. M. Heijligers,

Surface and Thin Film Phenomena

X-Ray SpectrometryVolume 29, Issue 3 p. 212-238 Research Article A systematic database of thin-film measurements by EPMA Part I – Aluminum films G. F. Bastin, Corresponding Author G. F. Bastin Laboratory of Solid State and Materials Chemistry, University of Technology, P.O. Box 513, NL-5600 MB Eindhoven, The NetherlandsLaboratory of Solid State and Materials Chemistry, University of Technology, P.O. Box 513, NL-5600 MB Eindhoven, The NetherlandsSearch for more papers by this authorH. J. M. Heijligers, H. J. M. Heijligers Laboratory of Solid State and Materials Chemistry, University of Technology, P.O. Box 513, NL-5600 MB Eindhoven, The NetherlandsSearch for more papers by this author G. F. Bastin, Corresponding Author G. F. Bastin Laboratory of Solid State and Materials Chemistry, University of Technology, P.O. Box 513, NL-5600 MB Eindhoven, The NetherlandsLaboratory of Solid State and Materials Chemistry, University of Technology, P.O. Box 513, NL-5600 MB Eindhoven, The NetherlandsSearch for more papers by this authorH. J. M. Heijligers, H. J. M. Heijligers Laboratory of Solid State and Materials Chemistry, University of Technology, P.O. Box 513, NL-5600 MB Eindhoven, The NetherlandsSearch for more papers by this author First published: 11 May 2000 https://doi.org/10.1002/(SICI)1097-4539(200005/06)29:3 3.0.CO;2-KCitations: 23AboutPDF ToolsRequest permissionExport citationAdd to favoritesTrack citation ShareShare Give accessShare full text accessShare full-text accessPlease review our Terms and Conditions of Use and check box below to share full-text version of article.I have read and accept the Wiley Online Library Terms and Conditions of UseShareable LinkUse the link below to share a full-text version of this article with your friends and colleagues. Learn more.Copy URL Abstract A systematic database of thin-film measurements on aluminum films by electron probe microanalysis is presented. The measurements were performed between 3 and 30 kV accelerating voltage on films of six different nominal thicknesses, ranging from 100 up to 3200 Å, which were deposited simultaneously on 20 different substrates, ranging between Be and Bi. The purpose of this work was to provide systematic data on which existing and future thin-film analysis programs can be tested. A total of 1060 k ratios for the film element Al were collected and 872 k ratios for the various substrate elements from underneath the films. Tests with our own most recent thin-film analysis program, TFA, based on the double Gaussian PROZA96 procedure, on this database showed excellent performance: a mean value of 1.0093 for kcalc/kmeas and a relative root-mean-square deviation of 4.2457% in the histogram for the film element. Copyright © 2000 John Wiley & Sons, Ltd. REFERENCES 1Packwood RH, Brown JD. X-Ray Spectrom. 1981; 10: 138. 2Bastin GF, van Loo FJJ, Heijligers HJM. X-Ray Spectrom. 1984; 13: 91. 3Bastin GF, Heijligers HJM. In Electron Probe Quantitation, Workshop at the National Bureau of Standards, Gaithersburg, Maryland, 1988, KFJ Heinrich, DE Newbury (eds). Plenum Press: New York, 1991; 145– 161. 4Pouchou JL, Pichoir F. Rech. Aérospat. 1984; 3: 13. 5Pouchou JL, Pichoir F, Boivin D. (a) Proceedings of 12th ICXOM, 28 Aug–1 Sep 1989, Cracow, Poland. S Jasienska, LJ Maksymowicz (eds). Cracow Academy of Mining and Metallurgy, 1990; 52; (b) Further Improvements in Quantitation Procedures for X-ray Microanalysis, ONERA Report TP 157, 1989. 6Bastin GF, Dijkstra JM, Heijligers HJM. X-Ray Spectrom. 1998; 27: 3. 7Merlet C. Inst. Phys. Conf. Ser. 1992;No. 130 123. 8Bastin GF, Heijligers HJM. Scanning 1990; 12: 225. 9Pouchou JL, Pichoir F. Rech. Aérospat. 1984; 5: 349. 10Packwood RH, Milliken KS. A general equation for predicting x-ray intensitites from stratified samples in the electron microprobe, CANMET Report No. PMRL/85-25 (TR), May 1985. 11August H-J, Wernisch J. Scanning 1987; 9: 145. 12Hunger H-J. Scanning 1988; 10: 65. 13Waldo RA. In Microbeam Analysis, DE Newbury (ed). San Francisco Press: San Francisco, 1988; 310– 314. 14Willich P, Obertop D. Surf. Interface Anal. 1988; 13: 20. 15Willich P, Obertop D. J. Phys. Colloque 1989; C-5: 285. 16Kyser DF, Murata K. In Proceedings of a Workshop on the Use of Monte Carlo Calculations in Electron Probe Microanalysis and Scanning Electron Microscopy. KFJ Heinrich, DE Newbury, H Yakowitz (eds). NBS Special Publication No. 460. National Bureau of Standards: Washington, DC, 1976; 129– 138. 17Ammann N. Thesis MS, R. W. T. H. Aachen, 1989. 18Bastin GF, Heijligers HJM, Dijkstra JM. In Proceedings of the XIIth International Congress for Electron Microscopy, Seattle (Washington, USA), August 1990, LD Peachey, DB Williams (eds). San Francisco Press: San Francisco, 1990; 216. 19Bastin GF, Dijkstra JM, Heijligers HJM. In Proceedings of the 50th Annual Meeting of the Electron Microscopy Society of America/27th Annual Meeting of the Microbeam Analysis Society/19th Annual Meeting of the Microscopical Society of Canada, GW Baily, J Bentley, JA Small (eds). San Francisco Press: San Francisco, 1992; 1648. 20Bastin GF, Dijkstra JM, Heijligers HJM, Klepper D. Microbeam Anal. 1993; 2: 29– 43. 21Pouchou JL, Pichoir F. In Proceedings of the 11th International Congress on X-Ray Optics and Microanalysis, JD Brown, RH Packwood (eds). Graphic Services, UWO: London, Canada, 1986; 249. 22Waldo RA. In Microbeam Analysis, DE Howitt (ed). San Francisco Press: San Francisco, 1991; 45– 53. Citing Literature Volume29, Issue3May/June 2000Pages 212-238 ReferencesRelatedInformation