Optical emission spectroscopy of active species in a TiCN PVD arc discharge
1995; Elsevier BV; Volume: 76-77; Linguagem: Inglês
10.1016/02578-9729(68)00077-
ISSN1879-3347
Autores Tópico(s)Diamond and Carbon-based Materials Research
ResumoIn this article, it is shown that a good correlation is obtained between optical emission spectroscopy (OES) measurements of the plasma light and the electron spectroscopy for chemical analysis (ESCA) of the TiCN coating of a steel wafer in a physical vapor deposition (PVD) arc discharge reactor. The reactor works in a N2-CH4 mixture, at a total pressure of about 10−2 mbar, and the plasma is created from a cathodic titanium arc with an evaporation voltage of 20 V and current intensity of 60 A. The TiCN deposition takes place at 20 cm from the arc discharge. The study performs the measurement of the relative intensities, spatially resolved, of the N2+ line at 427.5 nm, the Ti lines at 430.1 nm and 430.5 nm and the CH line at 431.4 nm as a function of the respective concentrations of the methane-nitrogen mixture. The ratio of the intensities of the plasma lines CH and N2+ is quasi-linearly related to the ratio of the concentrations C and N measured by ESCA on the coating. On the basis of the results obtained we are developing OES as non-intrusive and in situ diagnostic of the plasma reactive species for controlling the TiCN deposition process in an industrial reactor.
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