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Numerical Simulation of Liquid Drop Deposition in Annular-Mist Flow Regime of Boiling Water Reactor

2004; Taylor & Francis; Volume: 41; Issue: 5 Linguagem: Inglês

10.3327/jnst.41.569

1881-1248

Heng Xie, Seiichi Koshizuka, Y. Oka,

Fluid Dynamics Simulations and Interactions

The deposition process of a single droplet on the liquid film is numerically simulated by the Moving Particle Semi-implicit (MPS) method to analyze the possibility and effect of splash occurring in Boiling Water Reactor (BWR) condition. A simple one-dimensional mixture model is used to calculate the necessary parameters for the simulation of deposition. The rationality of the model is confirmed by comparison with the experimental results. A film buffer model is developed to arrange the simulation results. A correlation of the critical impact Weber number for splash is obtained. It is found that splash and subsequent re-entrainment process is significant and cannot be ignored in the high quality condition in BWR.