Artigo Acesso aberto

Reviewer Acknowledgements for International Journal of Chemistry, Vol. 9, No. 4

2017; Canadian Center of Science and Education; Volume: 9; Issue: 4 Linguagem: Inglês

10.5539/ijc.v9n4p124

ISSN

1916-9701

Autores

Albert John,

Tópico(s)

Inorganic and Organometallic Chemistry

Resumo

International Journal of Chemistry wishes to acknowledge the following individuals for their assistance with peer review of manuscripts for this issue. Their help and contributions in maintaining the quality of the journal is greatly appreciated. Many authors, regardless of whether International Journal of Chemistry publishes their work, appreciate the helpful feedback provided by the reviewers.Reviewers for Volume 9, Number 4 Abdul Rouf Dar, University of Florida, USAAhmad Galadima, Usmanu Danfodiyo University, NigeriaAhmet Ozan Gezerman, Yildiz Technical University, TurkeyAyodele Temidayo Odularu, University of Fort Hare, South AfricaBinod P Pandey, The Pennsylvania State University, USAChanchal Kumar Malik, Vanderbilt University, USADesheng Zheng, University of Houston, USAFatima Tuz Johra, Kookmin University, BangladeshHesham G. Ibrahim, Al-Mergheb University, LibyaJuan Rafael Garcia, (INCAPE) (FIQ, UNL-CONICET), ArgentinaKhaldun M. Al Azzam, Batterjee Medical College for Sciences and Technology, Saudi ArabiaMadduri Srinivasarao, Purdue University, USAMaolin Lu, Yale University, USAMohamed Abass, Ain Shams University, EgyptMustafa Oguzhan Kaya, Siirt University, TurkeyNejib Hussein Mekni, Al Manar University, TunisiaPraveen Kumar, Texas Tech University, USAR. K. Dey, Birla Institute of Technology (BIT), IndiaSitaram Acharya, Texas Christian University, USASitaram Bhavaraju, U.S.PHARMACOPEIA, USASujan Kumar Sarkar, Ruhr University Bochum, GermanyWaseem Hassan, Universidade Federal de Santa Maria, Brazil Albert JohnOn behalf of,The Editorial Board of International Journal of ChemistryCanadian Center of Science and Education

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