Nonthermal plasma induced NiS/UiO-66-NH2 for boosting visible-light photo-Fenton degradation of tetracycline hydrochloride
2023; Elsevier BV; Volume: 365; Linguagem: Inglês
10.1016/j.micromeso.2023.112894
ISSN1873-3093
AutoresHao Peng, Liping Wang, Zhou Yuliang, Bo Li, Xiaogang Zheng, Jing Wen,
Tópico(s)Covalent Organic Framework Applications
ResumoHeterojunctions constructed from metal organic frameworks (MOF) and metal sulfides are the potential candidates for solar-light driven photo-Fenton elimination of antibiotics from wastewater. To boost the solar-light induced photo-Fenton degradation of tetracycline hydrochloride (TCH) over UiO-66, NH2-functionlized UiO-66 (UiO-66-NH2) was in-situ loaded with NiS (NiS/NU-66) via the nonthermal plasma sulfurization. For comparison to UiO-66-NH2, NiS/NU-66 had the lower adsorption capacity while the higher photo-Fenton activity for TCH removal. The removal efficiency of NiS/NU-66 climbed and then declined with an increase in NiS content, and the best removal efficiency (84.92 ± 2.55 %) for 110 mg L−1 TCH solution was obtained by c-NiS/NU-66 in 150 min. The sulfur and oxygen defects as well as the plentiful functional groups over NiS/NU-66 were favorable for providing the abundant vacant sites of TCH adsorption and photons capture. In addition, the rapid separation and migration of photo-generated e−/h+ pairs were achieved at the tight junction interface between NiS and UiO-66-NH2, enlarging the visible-light absorption capacity. In NiS/NU-66-assisted photocatalytic system, H2O2 was efficiently convert to •OH by e− and Ni2+/Ni3+ couples in solar light region. Hence, •OH, •O2− and h+ played the vital roles in this photo-Fenton system.
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